Syntax
[CPLN,XPL]=CPLfillPattern(CPL,CPLA,[w,d,cut,pc])
Input Parameter
CPL : | | Contour to be filled |
CPLA : | | Filling pattern to be copied |
w : | | border thickness of CPL; default is 1 |
d : | | distance between the pattern; default is w |
cut : | | cut instead of removal of overlapping pattern; default is false |
pc : | | 'c' moves the contour into the center; is 'c' on by default |
Output Parameter
CPLN : | | CPL of resulting contour with punched patterns |
XPL : | | CPL of punching patterns |
Examples
Fill a circle with stars:
CPLfillPattern(PLcircle(30),PLstar(5,20),0,0); % Both contours are centered
CPLfillPattern(PLcircle(30),PLstar(5,20)+3,0,0); % Pattern shifting is ignored
CPLfillPattern(PLcircle(30)+10,PLstar(5,20),0,0); % Contour shifting is compensated
CPLfillPattern(PLcircle(30)+10,PLstar(5,20)+3,0,0,true,'x');
Copyright 2015-2025 Tim C. Lueth. All rights reserved. The code is the property of Tim C. Lueth and may not be redistributed or modified without explicit written permission. This software may be used free of charge for academic research and teaching purposes only. Commercial use, redistribution, modification, or reverse engineering is strictly prohibited. Access to source code is restricted and granted only under specific agreements. For licensing inquiries or commercial use, please contact: Tim C. Lueth
Last html export of this page out of FM database by TL: 2025-09-21